금속 또는 반금속-함유 필름의 제조 방법

본 발명은 무기 금속 또는 반금속-함유 필름의 제조 방법의 분야에 속한다. 상기 방법은 (a) 기체 상태의 금속 또는 반금속-함유 화합물을 고체 기판에 증착시키는 단계; 및 (b) 상기 고체 기판을 기체 상태의 하기 화학식 I, II 또는 III의 화합물과 접촉시키는 단계 를 포함한다: JPEGpct00021.jpg45129 상기 식에서, A는 NR, NR2, PR, PR2, O, OR, S 또는 SR이고, E는 N, NR, P, PR, O 또는 S이고, n은 1, 2 또는 3이고, R은 알킬 기, 알켄일 기, 아릴 기 또는 실릴...

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Hauptverfasser: MAYR LUKAS, KLENK SINJA VERENA, WEIGUNY SABINE, WINTER CHARLES, WEERATHUNGA SIRIKKATHUGE NILANKA, SCHWEINFURTH DAVID DOMINIQUE, KARUNARATNE THARINDU
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creator MAYR LUKAS
KLENK SINJA VERENA
WEIGUNY SABINE
WINTER CHARLES
WEERATHUNGA SIRIKKATHUGE NILANKA
SCHWEINFURTH DAVID DOMINIQUE
KARUNARATNE THARINDU
description 본 발명은 무기 금속 또는 반금속-함유 필름의 제조 방법의 분야에 속한다. 상기 방법은 (a) 기체 상태의 금속 또는 반금속-함유 화합물을 고체 기판에 증착시키는 단계; 및 (b) 상기 고체 기판을 기체 상태의 하기 화학식 I, II 또는 III의 화합물과 접촉시키는 단계 를 포함한다: JPEGpct00021.jpg45129 상기 식에서, A는 NR, NR2, PR, PR2, O, OR, S 또는 SR이고, E는 N, NR, P, PR, O 또는 S이고, n은 1, 2 또는 3이고, R은 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이고, R'은 수소, 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이되, A, E 및 n은 화학식 I, II 또는 III의 화합물이 전기적으로 중성이도록 선택된다. The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20220158672A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20220158672A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20220158672A3</originalsourceid><addsrcrecordid>eNrjZDB7taPjTVuvwusZE153TVF4vWEGRED37dQVb-YsUHg7teX1spY3c2covFkw583CDUAVK19vmsrDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-K9g4wMjIwMDE0tzMyNHI2JUwUACVs81g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>금속 또는 반금속-함유 필름의 제조 방법</title><source>esp@cenet</source><creator>MAYR LUKAS ; KLENK SINJA VERENA ; WEIGUNY SABINE ; WINTER CHARLES ; WEERATHUNGA SIRIKKATHUGE NILANKA ; SCHWEINFURTH DAVID DOMINIQUE ; KARUNARATNE THARINDU</creator><creatorcontrib>MAYR LUKAS ; KLENK SINJA VERENA ; WEIGUNY SABINE ; WINTER CHARLES ; WEERATHUNGA SIRIKKATHUGE NILANKA ; SCHWEINFURTH DAVID DOMINIQUE ; KARUNARATNE THARINDU</creatorcontrib><description>본 발명은 무기 금속 또는 반금속-함유 필름의 제조 방법의 분야에 속한다. 상기 방법은 (a) 기체 상태의 금속 또는 반금속-함유 화합물을 고체 기판에 증착시키는 단계; 및 (b) 상기 고체 기판을 기체 상태의 하기 화학식 I, II 또는 III의 화합물과 접촉시키는 단계 를 포함한다: JPEGpct00021.jpg45129 상기 식에서, A는 NR, NR2, PR, PR2, O, OR, S 또는 SR이고, E는 N, NR, P, PR, O 또는 S이고, n은 1, 2 또는 3이고, R은 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이고, R'은 수소, 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이되, A, E 및 n은 화학식 I, II 또는 III의 화합물이 전기적으로 중성이도록 선택된다. The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.</description><language>kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20221201&amp;DB=EPODOC&amp;CC=KR&amp;NR=20220158672A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20221201&amp;DB=EPODOC&amp;CC=KR&amp;NR=20220158672A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MAYR LUKAS</creatorcontrib><creatorcontrib>KLENK SINJA VERENA</creatorcontrib><creatorcontrib>WEIGUNY SABINE</creatorcontrib><creatorcontrib>WINTER CHARLES</creatorcontrib><creatorcontrib>WEERATHUNGA SIRIKKATHUGE NILANKA</creatorcontrib><creatorcontrib>SCHWEINFURTH DAVID DOMINIQUE</creatorcontrib><creatorcontrib>KARUNARATNE THARINDU</creatorcontrib><title>금속 또는 반금속-함유 필름의 제조 방법</title><description>본 발명은 무기 금속 또는 반금속-함유 필름의 제조 방법의 분야에 속한다. 상기 방법은 (a) 기체 상태의 금속 또는 반금속-함유 화합물을 고체 기판에 증착시키는 단계; 및 (b) 상기 고체 기판을 기체 상태의 하기 화학식 I, II 또는 III의 화합물과 접촉시키는 단계 를 포함한다: JPEGpct00021.jpg45129 상기 식에서, A는 NR, NR2, PR, PR2, O, OR, S 또는 SR이고, E는 N, NR, P, PR, O 또는 S이고, n은 1, 2 또는 3이고, R은 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이고, R'은 수소, 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이되, A, E 및 n은 화학식 I, II 또는 III의 화합물이 전기적으로 중성이도록 선택된다. The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB7taPjTVuvwusZE153TVF4vWEGRED37dQVb-YsUHg7teX1spY3c2covFkw583CDUAVK19vmsrDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-K9g4wMjIwMDE0tzMyNHI2JUwUACVs81g</recordid><startdate>20221201</startdate><enddate>20221201</enddate><creator>MAYR LUKAS</creator><creator>KLENK SINJA VERENA</creator><creator>WEIGUNY SABINE</creator><creator>WINTER CHARLES</creator><creator>WEERATHUNGA SIRIKKATHUGE NILANKA</creator><creator>SCHWEINFURTH DAVID DOMINIQUE</creator><creator>KARUNARATNE THARINDU</creator><scope>EVB</scope></search><sort><creationdate>20221201</creationdate><title>금속 또는 반금속-함유 필름의 제조 방법</title><author>MAYR LUKAS ; KLENK SINJA VERENA ; WEIGUNY SABINE ; WINTER CHARLES ; WEERATHUNGA SIRIKKATHUGE NILANKA ; SCHWEINFURTH DAVID DOMINIQUE ; KARUNARATNE THARINDU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220158672A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MAYR LUKAS</creatorcontrib><creatorcontrib>KLENK SINJA VERENA</creatorcontrib><creatorcontrib>WEIGUNY SABINE</creatorcontrib><creatorcontrib>WINTER CHARLES</creatorcontrib><creatorcontrib>WEERATHUNGA SIRIKKATHUGE NILANKA</creatorcontrib><creatorcontrib>SCHWEINFURTH DAVID DOMINIQUE</creatorcontrib><creatorcontrib>KARUNARATNE THARINDU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MAYR LUKAS</au><au>KLENK SINJA VERENA</au><au>WEIGUNY SABINE</au><au>WINTER CHARLES</au><au>WEERATHUNGA SIRIKKATHUGE NILANKA</au><au>SCHWEINFURTH DAVID DOMINIQUE</au><au>KARUNARATNE THARINDU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>금속 또는 반금속-함유 필름의 제조 방법</title><date>2022-12-01</date><risdate>2022</risdate><abstract>본 발명은 무기 금속 또는 반금속-함유 필름의 제조 방법의 분야에 속한다. 상기 방법은 (a) 기체 상태의 금속 또는 반금속-함유 화합물을 고체 기판에 증착시키는 단계; 및 (b) 상기 고체 기판을 기체 상태의 하기 화학식 I, II 또는 III의 화합물과 접촉시키는 단계 를 포함한다: JPEGpct00021.jpg45129 상기 식에서, A는 NR, NR2, PR, PR2, O, OR, S 또는 SR이고, E는 N, NR, P, PR, O 또는 S이고, n은 1, 2 또는 3이고, R은 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이고, R'은 수소, 알킬 기, 알켄일 기, 아릴 기 또는 실릴 기이되, A, E 및 n은 화학식 I, II 또는 III의 화합물이 전기적으로 중성이도록 선택된다. The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title 금속 또는 반금속-함유 필름의 제조 방법
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