HOT STAMPING COMPONENT AND METHOD FOR MANUFACTURING THE SAME

The present invention is to provide a hot stamping component with improved weldability and a method for manufacturing the same. A hot stamping component according to an embodiment of the present invention includes a steel plate; a plating layer disposed on the steel plate and including an intermixed...

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Bibliographische Detailangaben
Hauptverfasser:	KIM SUNG MIN, YOON SEUNG CHAE, KONG JE YOUL, YOO BYUNG GIL, YOOK WAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL METALLURGY PERFORMING OPERATIONS PUNCHING METAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS ORPROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL
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Beschreibung
Zusammenfassung:	The present invention is to provide a hot stamping component with improved weldability and a method for manufacturing the same. A hot stamping component according to an embodiment of the present invention includes a steel plate; a plating layer disposed on the steel plate and including an intermixed layer, a first layer (Al-rich FexAlySiz), a second layer (Fe-rich FexAlySiz), and a third layer (Al-rich FexAlySiz), which are sequentially laminated; and an oxide layer disposed on the plating layer and having a thickness of 30 nm to 100 nm. 본 발명의 일 실시예에 따른 핫 스탬핑 부품은 강판; 상기 강판 상에 위치하며, 순차적으로 적층된 상호혼합층, 제1 층(Al-rich FexAlySiz), 제2 층(Fe-rich FexAlySiz), 및 제3 층(Al-rich FexAlySiz)을 포함하는 도금층; 및 상기 도금층 상에 위치하고 30 nm 내지 100 nm의 두께를 갖는 산화층을 포함한다.