V-NAND V-NAND MEMORY HAVING DOUBLE OXIDE INTERLAYERS FOR IMPROVING FERROELECTRIC PERFORMANCE AND METHOD FOR MANUFACTURING THE SAME

Various embodiments provide a V-NAND memory having double oxide layers for improving ferroelectric performance and a method of manufacturing the same, and the V-NAND memory may comprise: a ferroelectric layer extending in one direction; and double oxide layers arranged at opposite sides with the fer...

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Bibliographische Detailangaben
Hauptverfasser: JEONG JAEKYEONG, YUN HEUB SONG, PARK HYEONG JIN
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:Various embodiments provide a V-NAND memory having double oxide layers for improving ferroelectric performance and a method of manufacturing the same, and the V-NAND memory may comprise: a ferroelectric layer extending in one direction; and double oxide layers arranged at opposite sides with the ferroelectric layer therebetween and each extending in the one direction. According to various embodiments, oxide layers induce the formation of an orthorhombic phase with respect to a ferroelectric layer by using the difference in coefficients of thermal expansion between the oxide layers and suppress the formation of an oxygen vacancy with respect to the ferroelectric layer. Thus, ferroelectric performance in a V-NAND memory can be improved. 다양한 실시예들은 강유전체 성능 향상을 위한 이중 산화물층들을 갖는 V-NAND 메모리 및 그 제조 방법을 제공하며, V-NAND 메모리는 일 방향으로 연장되는 강유전체층, 및 강유전체층을 사이에 두고 서로의 맞은 편에서, 일 방향으로 각각 연장되는 이중의 산화물층들을 포함할 수 있다. 다양한 실시예들에 따르면, 산화물층들이 산화물층들 사이에서의 열팽창 계수 차이를 이용하여 강유전체층에 대해 사방정상(orthorhombic phase) 형성을 유발시키고, 강유전체층에 대해 산소 빈자리 결함(oxygen vacancy) 형성을 억제시킴으로써, V-NAND 메모리에서의 강유전체 성능이 향상될 수 있다.