SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATE

The present invention provides a support unit. The support unit for supporting a substrate includes: a rotatable chuck stage; a heating member disposed above the chuck stage and heating the substrate supported by the support unit; a power line for transmitting electric power to the heating member; a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YUN KANG SEOP, SONG SOO HAN, CHOI JUNG BONG, KIM CHUL GOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention provides a support unit. The support unit for supporting a substrate includes: a rotatable chuck stage; a heating member disposed above the chuck stage and heating the substrate supported by the support unit; a power line for transmitting electric power to the heating member; a window disposed above the chuck stage and forming an internal space in which the heating member is disposed; and an interlock module for cutting off the electric power transmitted to the heating member when a set condition is satisfied. 본 발명은 지지 유닛을 제공한다. 기판을 지지하는 지지 유닛은, 회전 가능한 척 스테이지와; 상기 척 스테이지보다 상부에 배치되며, 상기 지지 유닛에 지지된 기판을 가열하는 가열 부재와; 상기 가열 부재에 전력을 전달하는 전원 라인과; 상기 척 스테이지보다 상부에 배치되며, 상기 가열 부재가 배치되는 내부 공간을 형성하는 윈도우와; 그리고, 설정 조건이 만족되면 상기 가열 부재로 전달되는 상기 전력을 차단하는 인터락 모듈을 포함할 수 있다.