Method for forming metal pattern selectively using water soluble polymer

The present invention relates to a method for forming a metal pattern selectively using a water-soluble polymer. One embodiment of the present invention comprises: forming a water-soluble polymer layer (20) by applying a water-soluble polymer material on the substrate (10) (S100); forming an etching...

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Bibliographische Detailangaben
Hauptverfasser: PARK JAE YOUNG, LEE HO NYUN, KIM HO HYEONG, LEE MIN SU, LEE HEUNG YEOL
Format: Patent
Sprache:eng ; kor
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