절삭 공구
기재와 이 기재 상에 형성된 피막을 포함하는 절삭 공구로서, 상기 피막은 제1 단위층과 제2 단위층을 갖는 다층 구조 층을 포함하고, 상기 다층 구조 층에 있어서, 상기 제1 단위층 및 상기 제2 단위층은 각각이 교대로 1층 이상 적층되어 있고, 상기 다층 구조 층에 있어서의 (200)면, (111)면 및 (220)면 각각의 X선 회절 강도를 I(200), I(111) 및 I(220)으로 한 경우, 이하의 식 1: 0.6≤I(200)/{I(200)+I(111)+I(220)}(식 1)을 만족하고, 상기 제1 단위층은, c축 방향의 면...
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| creator | SANO KENTA KUKINO SATORU MATSUKAWA MICHIKO TSUKIHARA NOZOMI |
| description | 기재와 이 기재 상에 형성된 피막을 포함하는 절삭 공구로서, 상기 피막은 제1 단위층과 제2 단위층을 갖는 다층 구조 층을 포함하고, 상기 다층 구조 층에 있어서, 상기 제1 단위층 및 상기 제2 단위층은 각각이 교대로 1층 이상 적층되어 있고, 상기 다층 구조 층에 있어서의 (200)면, (111)면 및 (220)면 각각의 X선 회절 강도를 I(200), I(111) 및 I(220)으로 한 경우, 이하의 식 1: 0.6≤I(200)/{I(200)+I(111)+I(220)}(식 1)을 만족하고, 상기 제1 단위층은, c축 방향의 면 간격 d1c가 a축 방향의 면 간격 d1a보다도 큰 NaCl 모양 구조이고, 상기 제2 단위층은, c축 방향의 면 간격 d2c가 a축 방향의 면 간격 d2a보다도 작은 NaCl 모양 구조이고, 이하의 식 2, 식 3 및 식 4: 1≤d1a/d2a≤1.02(식 2) 1.01≤d1c/d2c≤1.05(식 3) d1a/d2a |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20220124167A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20220124167A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20220124167A3</originalsourceid><addsrcrecordid>eNrjZOB9s6DjTdNahVebt77auoaHgTUtMac4lRdKczMou7mGOHvophbkx6cWFyQmp-allsR7BxkZGBkZGBqZGJqZOxoTpwoAIA8isg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>절삭 공구</title><source>esp@cenet</source><creator>SANO KENTA ; KUKINO SATORU ; MATSUKAWA MICHIKO ; TSUKIHARA NOZOMI</creator><creatorcontrib>SANO KENTA ; KUKINO SATORU ; MATSUKAWA MICHIKO ; TSUKIHARA NOZOMI</creatorcontrib><description>기재와 이 기재 상에 형성된 피막을 포함하는 절삭 공구로서, 상기 피막은 제1 단위층과 제2 단위층을 갖는 다층 구조 층을 포함하고, 상기 다층 구조 층에 있어서, 상기 제1 단위층 및 상기 제2 단위층은 각각이 교대로 1층 이상 적층되어 있고, 상기 다층 구조 층에 있어서의 (200)면, (111)면 및 (220)면 각각의 X선 회절 강도를 I(200), I(111) 및 I(220)으로 한 경우, 이하의 식 1: 0.6≤I(200)/{I(200)+I(111)+I(220)}(식 1)을 만족하고, 상기 제1 단위층은, c축 방향의 면 간격 d1c가 a축 방향의 면 간격 d1a보다도 큰 NaCl 모양 구조이고, 상기 제2 단위층은, c축 방향의 면 간격 d2c가 a축 방향의 면 간격 d2a보다도 작은 NaCl 모양 구조이고, 이하의 식 2, 식 3 및 식 4: 1≤d1a/d2a≤1.02(식 2) 1.01≤d1c/d2c≤1.05(식 3) d1a/d2a<d1c/d2c(식 4)을 만족한다.
A cutting tool includes: a substrate; and a coating film provided on the substrate, whereinthe coating film includes a multilayer structure layer having one or more first unit layers and one or more second unit layers,in the multilayer structure layer, the one or more first unit layers and the one or more second unit layers are alternately layered,when X-ray diffraction intensities of a (200) plane, a (111) plane, and a (220) plane in the multilayer structure layer are respectively represented by I(200), I(111), and I(220), the following formula 1 is satisfied: 0.6≤I200/I200+I111+I220each of the one or more first unit layers has a NaCl-like structure in which an interplanar spacing d1c in a c-axis direction is larger than an interplanar spacing d1a in an a-axis direction,each of the one or more second unit layers has a NaCl-like structure in which an interplanar spacing d2c in the c-axis direction is smaller than an interplanar spacing d2a in the a-axis direction, andthe following formulas 2, 3 and 4 are satisfied: 1≤d1a/d2a≤1.021.01≤d1c/d2c≤1.05 and d1a/d2a<d1c/d2c</description><language>kor</language><subject>BORING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MACHINE TOOLS ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; METALLURGY ; MILLING ; PERFORMING OPERATIONS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING ; TURNING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220913&DB=EPODOC&CC=KR&NR=20220124167A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220913&DB=EPODOC&CC=KR&NR=20220124167A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SANO KENTA</creatorcontrib><creatorcontrib>KUKINO SATORU</creatorcontrib><creatorcontrib>MATSUKAWA MICHIKO</creatorcontrib><creatorcontrib>TSUKIHARA NOZOMI</creatorcontrib><title>절삭 공구</title><description>기재와 이 기재 상에 형성된 피막을 포함하는 절삭 공구로서, 상기 피막은 제1 단위층과 제2 단위층을 갖는 다층 구조 층을 포함하고, 상기 다층 구조 층에 있어서, 상기 제1 단위층 및 상기 제2 단위층은 각각이 교대로 1층 이상 적층되어 있고, 상기 다층 구조 층에 있어서의 (200)면, (111)면 및 (220)면 각각의 X선 회절 강도를 I(200), I(111) 및 I(220)으로 한 경우, 이하의 식 1: 0.6≤I(200)/{I(200)+I(111)+I(220)}(식 1)을 만족하고, 상기 제1 단위층은, c축 방향의 면 간격 d1c가 a축 방향의 면 간격 d1a보다도 큰 NaCl 모양 구조이고, 상기 제2 단위층은, c축 방향의 면 간격 d2c가 a축 방향의 면 간격 d2a보다도 작은 NaCl 모양 구조이고, 이하의 식 2, 식 3 및 식 4: 1≤d1a/d2a≤1.02(식 2) 1.01≤d1c/d2c≤1.05(식 3) d1a/d2a<d1c/d2c(식 4)을 만족한다.
A cutting tool includes: a substrate; and a coating film provided on the substrate, whereinthe coating film includes a multilayer structure layer having one or more first unit layers and one or more second unit layers,in the multilayer structure layer, the one or more first unit layers and the one or more second unit layers are alternately layered,when X-ray diffraction intensities of a (200) plane, a (111) plane, and a (220) plane in the multilayer structure layer are respectively represented by I(200), I(111), and I(220), the following formula 1 is satisfied: 0.6≤I200/I200+I111+I220each of the one or more first unit layers has a NaCl-like structure in which an interplanar spacing d1c in a c-axis direction is larger than an interplanar spacing d1a in an a-axis direction,each of the one or more second unit layers has a NaCl-like structure in which an interplanar spacing d2c in the c-axis direction is smaller than an interplanar spacing d2a in the a-axis direction, andthe following formulas 2, 3 and 4 are satisfied: 1≤d1a/d2a≤1.021.01≤d1c/d2c≤1.05 and d1a/d2a<d1c/d2c</description><subject>BORING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MACHINE TOOLS</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>METALLURGY</subject><subject>MILLING</subject><subject>PERFORMING OPERATIONS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><subject>TURNING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOB9s6DjTdNahVebt77auoaHgTUtMac4lRdKczMou7mGOHvophbkx6cWFyQmp-allsR7BxkZGBkZGBqZGJqZOxoTpwoAIA8isg</recordid><startdate>20220913</startdate><enddate>20220913</enddate><creator>SANO KENTA</creator><creator>KUKINO SATORU</creator><creator>MATSUKAWA MICHIKO</creator><creator>TSUKIHARA NOZOMI</creator><scope>EVB</scope></search><sort><creationdate>20220913</creationdate><title>절삭 공구</title><author>SANO KENTA ; KUKINO SATORU ; MATSUKAWA MICHIKO ; TSUKIHARA NOZOMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220124167A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2022</creationdate><topic>BORING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MACHINE TOOLS</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>METALLURGY</topic><topic>MILLING</topic><topic>PERFORMING OPERATIONS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><topic>TURNING</topic><toplevel>online_resources</toplevel><creatorcontrib>SANO KENTA</creatorcontrib><creatorcontrib>KUKINO SATORU</creatorcontrib><creatorcontrib>MATSUKAWA MICHIKO</creatorcontrib><creatorcontrib>TSUKIHARA NOZOMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SANO KENTA</au><au>KUKINO SATORU</au><au>MATSUKAWA MICHIKO</au><au>TSUKIHARA NOZOMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>절삭 공구</title><date>2022-09-13</date><risdate>2022</risdate><abstract>기재와 이 기재 상에 형성된 피막을 포함하는 절삭 공구로서, 상기 피막은 제1 단위층과 제2 단위층을 갖는 다층 구조 층을 포함하고, 상기 다층 구조 층에 있어서, 상기 제1 단위층 및 상기 제2 단위층은 각각이 교대로 1층 이상 적층되어 있고, 상기 다층 구조 층에 있어서의 (200)면, (111)면 및 (220)면 각각의 X선 회절 강도를 I(200), I(111) 및 I(220)으로 한 경우, 이하의 식 1: 0.6≤I(200)/{I(200)+I(111)+I(220)}(식 1)을 만족하고, 상기 제1 단위층은, c축 방향의 면 간격 d1c가 a축 방향의 면 간격 d1a보다도 큰 NaCl 모양 구조이고, 상기 제2 단위층은, c축 방향의 면 간격 d2c가 a축 방향의 면 간격 d2a보다도 작은 NaCl 모양 구조이고, 이하의 식 2, 식 3 및 식 4: 1≤d1a/d2a≤1.02(식 2) 1.01≤d1c/d2c≤1.05(식 3) d1a/d2a<d1c/d2c(식 4)을 만족한다.
A cutting tool includes: a substrate; and a coating film provided on the substrate, whereinthe coating film includes a multilayer structure layer having one or more first unit layers and one or more second unit layers,in the multilayer structure layer, the one or more first unit layers and the one or more second unit layers are alternately layered,when X-ray diffraction intensities of a (200) plane, a (111) plane, and a (220) plane in the multilayer structure layer are respectively represented by I(200), I(111), and I(220), the following formula 1 is satisfied: 0.6≤I200/I200+I111+I220each of the one or more first unit layers has a NaCl-like structure in which an interplanar spacing d1c in a c-axis direction is larger than an interplanar spacing d1a in an a-axis direction,each of the one or more second unit layers has a NaCl-like structure in which an interplanar spacing d2c in the c-axis direction is smaller than an interplanar spacing d2a in the a-axis direction, andthe following formulas 2, 3 and 4 are satisfied: 1≤d1a/d2a≤1.021.01≤d1c/d2c≤1.05 and d1a/d2a<d1c/d2c</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BORING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY MILLING PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TURNING |
| title | 절삭 공구 |
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