SEMICONDUCTOR DEVICES AND A METHOD OF FORMING THE SAME

The present invention provides a semiconductor device minimizing pattern errors and a manufacturing method thereof. The semiconductor device includes: a substrate including a first area and a second area; information storage patterns spaced from each other in a first direction parallel to the upper...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIN HYUNCHUL, BAE BYOUNGJAE, KWON SHIN, RYU KYOUNGHUN, LEE GAWON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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