APPARATUS AND METHOD FOR FORMING FINE PATTERN

Disclosed are a fine pattern forming device and method. The fine pattern forming device of the present invention includes a lower electrode supporting a fluid thin film; an upper electrode positioned at an upper part of the lower electrode, spaced apart from the lower electrode by a first distance,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK HYUNGJE, HWANG JAESEOK, KANG DAEJOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL TECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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