APPARATUS AND METHOD FOR FORMING FINE PATTERN

Disclosed are a fine pattern forming device and method. The fine pattern forming device of the present invention includes a lower electrode supporting a fluid thin film; an upper electrode positioned at an upper part of the lower electrode, spaced apart from the lower electrode by a first distance,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	PARK HYUNGJE, HWANG JAESEOK, KANG DAEJOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL TECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed are a fine pattern forming device and method. The fine pattern forming device of the present invention includes a lower electrode supporting a fluid thin film; an upper electrode positioned at an upper part of the lower electrode, spaced apart from the lower electrode by a first distance, and formed with a master pattern; and a power supply unit for forming an electric field by applying pulsed DC high voltage between the lower electrode and the upper electrode. In the fine pattern forming device, a uniform pattern can be easily formed over a large area by using wide intervals and high pulsed DC high voltage. 본 발명은 미세 패턴 형성 장치 및 방법을 개시한다. 본 발명의 미세 패턴 형성 장치는 유체 박막을 지지하는 하부 전극, 상기 하부 전극 상부에 위치하고, 상기 하부 전극으로부터 제1 간격만큼 이격되며, 마스터 패턴이 형성된 상부 전극 및 상기 하부 전극과 상기 상부 전극 사이에 펄스형 직류 고전압을 인가하여 전기장을 형성하는 전원장치를 포함하며, 넓은 간격과 높은 펄스형 직류 고전압을 이용함으로써 대면적에 걸쳐 균일한 패턴을 용이하게 형성할 수 있다.