DEFECT DETECTION METHOD METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME AND DEFECT DECTECTION SYSTEM PERFORMING THE SAME

In a defect detection method, a substrate is placed on a stage. A 2D image is obtained by scanning the surface of the substrate using light. A defect location is detected in the 2D image. An intensity profile is performed on each pixel corresponding to the defect location to generate 3D image inform...

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Bibliographische Detailangaben

Hauptverfasser:	AKIYAMA SATOSHI, YOU JAE YOUNG, CHOI MIN HO, KIM JIN WOO, LEE GYE YOUNG, ANDO TOSHITSUGU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS SEMICONDUCTOR DEVICES
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