SUBSTRATE HEATING APPARATUS SUBSTRATE HEATING METHOD AND INFRARED HEATER

The present invention is to improve the balance of the temperature distribution of an infrared heater. The substrate heating apparatus of an embodiment includes: a pressure reducing part for reducing the atmosphere of the receiving space of a substrate coated with a solution; and an infrared heater...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAYA KENICHI, KATO SHIGERU, MASU YOSHIAKI, SAHODA TSUTOMU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention is to improve the balance of the temperature distribution of an infrared heater. The substrate heating apparatus of an embodiment includes: a pressure reducing part for reducing the atmosphere of the receiving space of a substrate coated with a solution; and an infrared heater capable of heating the substrate with infrared rays. The infrared heater includes a bend part bent to form a tube bent at a plurality of points and convex outward; and a cover part arranged to cover at least a portion of the bend part from the outside. (과제) 적외선 히터의 온도 분포의 밸런스를 향상시킨다. (해결 수단) 실시형태의 기판 가열 장치는, 용액을 도포한 기판의 수용 공간의 분위기를 감압하는 감압부와, 상기 기판을 적외선에 의해 가열 가능한 적외선 히터를 포함하고, 상기 적외선 히터는, 복수 지점에서 절곡된 관상을 이룸과 함께, 외방으로 볼록을 이루도록 절곡된 벤드부와, 상기 벤드부의 적어도 일부를 외방으로부터 덮도록 배치된 커버부를 포함한다.