Sputtering target with reinforced O-ring groove and method for manufacturing the same

According to one embodiment of the present invention, as a sputtering target configured with a target part and a backing plate part, provided is the sputtering target comprising: a first reinforcement part formed on an upper surface of the backing plate part to surround a surrounding of the target p...

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Bibliographische Detailangaben
Hauptverfasser:	HAN SEONG HUI, HYUNKOOCK SHIN, PARK JUN SEOCK, PARK DU RI, JIN KI JONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	According to one embodiment of the present invention, as a sputtering target configured with a target part and a backing plate part, provided is the sputtering target comprising: a first reinforcement part formed on an upper surface of the backing plate part to surround a surrounding of the target part; and a groove for an O-ring formed to surround the surrounding of the target part within an area of the first reinforcement part, wherein the first reinforcement part is formed of a material having a higher mechanical strength than that of the backing plate part. Therefore, the present invention is capable of having a technical effect of increasing a rigidity of the sputtering target. 본 발명의 일 실시예에 따르면, 타겟부와 백킹 플레이트부로 구성된 스퍼터링 타겟으로서, 상기 백킹 플레이트부의 상면에 상기 타겟부 주위를 둘러싸도록 형성된 제1 보강부; 및 제1 보강부의 영역 내에서 상기 타겟부 주위를 둘러싸도록 형성된 오링용 그루브;를 포함하고, 제1 보강부는 상기 백킹 플레이트부보다 기계적 강도가 높은 재질로 형성된 것을 특징으로 하는 스퍼터링 타겟을 제공한다.