증착 챔버를 위한 가스 분배 세라믹 가열기

증착 챔버를 위한 덮개 가열기(lid heater)의 실시예들이 본원에서 제공된다. 일부 실시예들에서, 증착 챔버를 위한 덮개 가열기는, 제2 면에 대향하는 제1 면을 갖는 세라믹 가열기 바디 - 세라믹 가열기 바디는 제1 면 상의 하나 이상의 제1 가스 유입구들로부터 연장되는 제1 복수의 가스 채널들을 포함하고, 하나 이상의 제1 가스 유입구들 각각은 제2 면 상의 복수의 제1 가스 배출구들로 연장됨 -; 세라믹 가열기 바디에 매립된 가열 엘리먼트; 및 세라믹 가열기 바디에서 제2 면 근처에 매립된 RF 전극을 포함하며, 제1 복...

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Hauptverfasser: RAVI JALLEPALLY, WU DIEN YEH, LEI PINGYAN, YUAN XIAOXIONG, YADAMANE SANDESH, PURATHE VINOD KONDA, KOPPA MANJUNATHA, TOORIHAL AMBARISH
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creator RAVI JALLEPALLY
WU DIEN YEH
LEI PINGYAN
YUAN XIAOXIONG
YADAMANE SANDESH
PURATHE VINOD KONDA
KOPPA MANJUNATHA
TOORIHAL AMBARISH
description 증착 챔버를 위한 덮개 가열기(lid heater)의 실시예들이 본원에서 제공된다. 일부 실시예들에서, 증착 챔버를 위한 덮개 가열기는, 제2 면에 대향하는 제1 면을 갖는 세라믹 가열기 바디 - 세라믹 가열기 바디는 제1 면 상의 하나 이상의 제1 가스 유입구들로부터 연장되는 제1 복수의 가스 채널들을 포함하고, 하나 이상의 제1 가스 유입구들 각각은 제2 면 상의 복수의 제1 가스 배출구들로 연장됨 -; 세라믹 가열기 바디에 매립된 가열 엘리먼트; 및 세라믹 가열기 바디에서 제2 면 근처에 매립된 RF 전극을 포함하며, 제1 복수의 가스 채널들은 RF 전극을 통해 연장된다. Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.
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Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.</description><language>kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220728&amp;DB=EPODOC&amp;CC=KR&amp;NR=20220106207A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220728&amp;DB=EPODOC&amp;CC=KR&amp;NR=20220106207A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAVI JALLEPALLY</creatorcontrib><creatorcontrib>WU DIEN YEH</creatorcontrib><creatorcontrib>LEI PINGYAN</creatorcontrib><creatorcontrib>YUAN XIAOXIONG</creatorcontrib><creatorcontrib>YADAMANE SANDESH</creatorcontrib><creatorcontrib>PURATHE VINOD KONDA</creatorcontrib><creatorcontrib>KOPPA MANJUNATHA</creatorcontrib><creatorcontrib>TOORIHAL AMBARISH</creatorcontrib><title>증착 챔버를 위한 가스 분배 세라믹 가열기</title><description>증착 챔버를 위한 덮개 가열기(lid heater)의 실시예들이 본원에서 제공된다. 일부 실시예들에서, 증착 챔버를 위한 덮개 가열기는, 제2 면에 대향하는 제1 면을 갖는 세라믹 가열기 바디 - 세라믹 가열기 바디는 제1 면 상의 하나 이상의 제1 가스 유입구들로부터 연장되는 제1 복수의 가스 채널들을 포함하고, 하나 이상의 제1 가스 유입구들 각각은 제2 면 상의 복수의 제1 가스 배출구들로 연장됨 -; 세라믹 가열기 바디에 매립된 가열 엘리먼트; 및 세라믹 가열기 바디에서 제2 면 근처에 매립된 RF 전극을 포함하며, 제1 복수의 가스 채널들은 RF 전극을 통해 연장된다. Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB8s2zumw0rFd5snPJ6U8vrpXsU3sxpeTt1jsKrDQ1vupYovN7W8nrDBoU3LTtez93zev1OsPj0La92bOBhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGRkYGhgZmRgbmjsbEqQIAu5o_6g</recordid><startdate>20220728</startdate><enddate>20220728</enddate><creator>RAVI JALLEPALLY</creator><creator>WU DIEN YEH</creator><creator>LEI PINGYAN</creator><creator>YUAN XIAOXIONG</creator><creator>YADAMANE SANDESH</creator><creator>PURATHE VINOD KONDA</creator><creator>KOPPA MANJUNATHA</creator><creator>TOORIHAL AMBARISH</creator><scope>EVB</scope></search><sort><creationdate>20220728</creationdate><title>증착 챔버를 위한 가스 분배 세라믹 가열기</title><author>RAVI JALLEPALLY ; WU DIEN YEH ; LEI PINGYAN ; YUAN XIAOXIONG ; YADAMANE SANDESH ; PURATHE VINOD KONDA ; KOPPA MANJUNATHA ; TOORIHAL AMBARISH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220106207A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>RAVI JALLEPALLY</creatorcontrib><creatorcontrib>WU DIEN YEH</creatorcontrib><creatorcontrib>LEI PINGYAN</creatorcontrib><creatorcontrib>YUAN XIAOXIONG</creatorcontrib><creatorcontrib>YADAMANE SANDESH</creatorcontrib><creatorcontrib>PURATHE VINOD KONDA</creatorcontrib><creatorcontrib>KOPPA MANJUNATHA</creatorcontrib><creatorcontrib>TOORIHAL AMBARISH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAVI JALLEPALLY</au><au>WU DIEN YEH</au><au>LEI PINGYAN</au><au>YUAN XIAOXIONG</au><au>YADAMANE SANDESH</au><au>PURATHE VINOD KONDA</au><au>KOPPA MANJUNATHA</au><au>TOORIHAL AMBARISH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>증착 챔버를 위한 가스 분배 세라믹 가열기</title><date>2022-07-28</date><risdate>2022</risdate><abstract>증착 챔버를 위한 덮개 가열기(lid heater)의 실시예들이 본원에서 제공된다. 일부 실시예들에서, 증착 챔버를 위한 덮개 가열기는, 제2 면에 대향하는 제1 면을 갖는 세라믹 가열기 바디 - 세라믹 가열기 바디는 제1 면 상의 하나 이상의 제1 가스 유입구들로부터 연장되는 제1 복수의 가스 채널들을 포함하고, 하나 이상의 제1 가스 유입구들 각각은 제2 면 상의 복수의 제1 가스 배출구들로 연장됨 -; 세라믹 가열기 바디에 매립된 가열 엘리먼트; 및 세라믹 가열기 바디에서 제2 면 근처에 매립된 RF 전극을 포함하며, 제1 복수의 가스 채널들은 RF 전극을 통해 연장된다. Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title 증착 챔버를 위한 가스 분배 세라믹 가열기
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