적층 제조용 금속 분말

본 발명은, 중량으로 함량이 표현된 다음의 원소: 0.01% ≤ C ≤ 0.2%, 2.5% ≤ Ti ≤ 10%, (0.45 xTi) - 1.35% ≤ B ≤ (0.45 xTi) + 0.70%, S ≤ 0.03%, P ≤ 0.04%, N ≤ 0.05%, O ≤ 0.05% 를 포함하고, 선택적으로: Si ≤ 1.5%, Mn ≤ 3%, Al ≤ 1.5%, Ni ≤ 1%, Mo ≤ 1%, Cr ≤ 3%, Cu ≤ 1%, Nb ≤ 0.1%, V ≤ 0.5% 를 함유하고, TiB2 및 선택적으로 Fe2B 의 공정 석출물들을 포함하고, 잔부가...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DAESCHLER VALERIE, REMENTERIA FERNANDEZ ROSALIA, SEGOVIA PEREZ DIEGO ALEJANDRO, BONNET FREDERIC
Format: Patent
Sprache:kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!