Thin film deposition method

The present invention relates to a thin film deposition method. More specifically, the present invention relates to the deposition method of a thin film, which is deposited using a PECVD method and can maximize light absorption in a visible ray region. The thin film deposition method of the present...

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Bibliographische Detailangaben
Hauptverfasser:	YOOK JI YONG, LEE HONG JAE, SHIM WOO PIL, YOON SUNG YEAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a thin film deposition method. More specifically, the present invention relates to the deposition method of a thin film, which is deposited using a PECVD method and can maximize light absorption in a visible ray region. The thin film deposition method of the present invention comprises: a preparation step; a supply step; and a deposition step. 본 발명은 박막증착방법에 대한 것으로서, 보다 상세하게는 PECVD 방식을 이용하여 증착되며 가시광선 영역대 빛의 흡수율을 최대한 높일 수 있는 박막의 증착방법에 대한 것이다.