Novel sulfonic acid derivative of naphthalimide and a photoacid generator and a photoresist composition comprising the same

The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition comprising the same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising the sam...

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Bibliographische Detailangaben
Hauptverfasser:	LEE CHI WAN, KIM MIN JUNG, CHOI YU NA, KANG KI TAE, OH CHUN RIM, CHOI DAE HYUK, LEE DEUK RAK, LEE WON JUNG, CHOI JI EUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition comprising the same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising the same, wherein the compound has excellent absorbance for light of i-line (365 nm) wavelength, is greatly easy to prepare a polymerizable composition due to very high solubility in an organic solvent, has good thermal stability, and exhibits a favorable acid generation rate. 본 발명은 나프탈이미드의 술폰산 유도체, 및 이를 포함하는 광산 발생제 및 포토레지스트 조성물에 관한 것으로, 보다 상세하게는, i-line(365㎚) 파장의 광에 대한 흡광도가 우수하며, 유기 용매에 대한 용해성이 매우 높아 중합성 조성물 제조가 매우 용이하고, 열적 안정성이 좋으며, 양호한 산 발생율을 나타내는 나프탈이미드의 술폰산 유도체 화합물, 및 이를 포함하는 광산 발생제 및 포토레지스트 조성물에 관한 것이다.