SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

Disclosed is a substrate treatment system, which comprises: a first substrate holding unit including a first base facing a substrate from a lower side, wherein the substrate has a surface to be protected and a surface to be cleaned, which is opposite to the surface to be protected, and the surface t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HONSHO KAZUHIRO, ISHII JUNICHI, ISHII HIROAKI
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!