A Plasma Scrubber Apparatus With a Structure of Distributing a Supplying Amount

The present invention relates to a plasma scrubber device with a supply distribution structure. A plasma scrubber device with a supply distribution structure includes a vacuum pump (11) for discharging process gas from a process chamber; a plasma reactor (13) for processing the process gas supplied...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	LEE HA KYUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEPARATION TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to a plasma scrubber device with a supply distribution structure. A plasma scrubber device with a supply distribution structure includes a vacuum pump (11) for discharging process gas from a process chamber; a plasma reactor (13) for processing the process gas supplied from the vacuum pump (11) by plasma reaction; and a distribution means for supplying the process gas from the vacuum pump (11) to the plasma reactor (13) through at least two supply paths. According to the present invention, pyrolysis efficiency can be improved. 본 발명은 공급 분배 구조의 플라즈마 스크러버 장치에 관한 것이다. 공급 분배 구조의 플라즈마 스크러버 장치는 공정 챔버로부터 공정 기체를 배출시키는 진공 펌프(11); 진공 펌프(11)로부터 공급되는 공정 기체를 플라즈마 반응에 의하여 처리하는 플라즈마 반응기(13); 및 진공 펌프(11)로부터 플라즈마 반응기(13)로 적어도 두 개의 공급 경로를 통하여 공정 기체를 공급하는 분배 수단을 포함한다.