APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR PROCESSING SUBSTRATE

Provided is a substrate processing device, which includes: a drain box accommodating the processing liquid drained from the processing process; and a drain line for draining the processing liquid from the drain box. In particular, a spraying unit may be provided to block air flowing into the drain b...

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Bibliographische Detailangaben
Hauptverfasser:	LEE MU HYEON, LEE YEON JU, JEON IN RYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Provided is a substrate processing device, which includes: a drain box accommodating the processing liquid drained from the processing process; and a drain line for draining the processing liquid from the drain box. In particular, a spraying unit may be provided to block air flowing into the drain box and/or spray gas or/and liquid to the drain box so that humidity in the drain box can be maintained within a set range. 기판 처리 장치는 처리 공정으로부터 드레인되는 처리액을 수용하는 드레인 박스와, 상기 드레인 박스로부터 상기 처리액을 드레인시키는 드레인 라인를 포함할 수 있고, 특히 상기 드레인 박스로 유입되는 공기를 차단하거나 또는/및 상기 드레인 박스에서의 습도가 설정 범위를 유지할 수 있게 상기 드레인 박스에 기체 또는/및 액체를 분사하도록 구비되는 분사부를 포함할 수 있다.