POLYIMIDE-BASED POLYMER FILM SUBSTRATE FOR DISPLAY DEVICE CIRCUIT BOARD OPTICAL DEVICE AND ELECTRONIC DEVICE USING THE SAME

The present invention relates to a polyimide-based resin film and a substrate for a display device, a circuit board, an optical device, and an electronic device using the same which comprises a polyimide-based resin including a polyimide repeating unit synthesized by making an acid anhydride compoun...

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Bibliographische Detailangaben
Hauptverfasser:	LEE MIN WOOK, PARK CHAN HYO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADVERTISING AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON CRYPTOGRAPHY DISPLAY DISPLAYING EDUCATION GENERAL PROCESSES OF COMPOUNDING LABELS OR NAME-PLATES MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS SEALS SIGNS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a polyimide-based resin film and a substrate for a display device, a circuit board, an optical device, and an electronic device using the same which comprises a polyimide-based resin including a polyimide repeating unit synthesized by making an acid anhydride compound having a specific structure reaction with a diamine compound and has an average transmittance of 60% or more at a wavelength of 380 or more and 780 or less and a phase difference value of 150 nm or less in a thickness direction of 10 μm. 본 발명은 특정 구조의 산무수물 화합물과 디아민 화합물의 반응으로 합성된 폴리이미드 반복단위를 포함한 폴리이미드계 수지를 포함하고, 380 nm 이상 780 nm 이하 파장에서의 평균 투과도가 60% 이상이며, 10 ㎛ 두께에서의 두께방향의 위상차 값이 150 nm 이하인 폴리이미드계 수지 필름 및 이를 이용한 디스플레이 장치용 기판, 회로 기판, 광학 장치 및 전자 장치에 관한 것이다.