POLISHING SLURRY COMPOSITION

The present invention relates to a polishing slurry composition, and more specifically, to a polishing slurry composition which comprises: abrasive particles; an oxidizing agent; an iron-containing catalyst; and a stabilizer, wherein the residual oil ratio of the oxidizing agent is 70% or more accor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HWANG JIN SOOK, LEE EUN JIN, KONG HYUN GOO
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:The present invention relates to a polishing slurry composition, and more specifically, to a polishing slurry composition which comprises: abrasive particles; an oxidizing agent; an iron-containing catalyst; and a stabilizer, wherein the residual oil ratio of the oxidizing agent is 70% or more according to equation 1. [Equation 1] The residual oil ratio of the oxidizing agent = (the concentration (%) of the oxidizing agent after 7 days at room temperature × 100)/(the initial concentration (%) of the oxidizing agent in the polishing slurry composition). 본 발명은, 연마 슬러리 조성물에 관한 것으로, 보다 구체적으로, 연마 입자; 산화제; 철 함유 촉매; 및 안정화제를 포함하고, 상기 산화제의 잔유율이 하기의 식 1에 따라 70 % 이상인 것인, 연마 슬러리 조성물에 관한 것이다. [식 1] 산화제의 잔유율=(상온 7일 경과 후 산화제의 농도(%)×100)/(연마 슬러리 조성물 내 산화제 초기 농도(%))