SUBSTRATE PROCESSING APPARATUS METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SUBSTRATE PROCESSING METHOD AND PROGRAM

According to one or more embodiments of the present disclosure, provided is a substrate processing device which comprises: a gas supply unit supplying process gas to a substrate inside a reaction chamber; a gas supply pipe connected to the gas supply unit; a plurality of valves provided in the gas s...

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Bibliographische Detailangaben
Hauptverfasser:	TAKEBAYASHI MOTONARI, NAKAJO HIROSHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	According to one or more embodiments of the present disclosure, provided is a substrate processing device which comprises: a gas supply unit supplying process gas to a substrate inside a reaction chamber; a gas supply pipe connected to the gas supply unit; a plurality of valves provided in the gas supply pipe; a gas supply system having a plurality of pressure measurement units provided between the plurality of valves; and a control unit configured to determine an occlusion level of the gas supply pipe based on at least one pressure among a measurement result of the pressure measurement units. 본 개시의 하나 이상의 실시에에 따르면, 반응실 내의 기판에 처리 가스를 공급하는 가스 공급부와, 상기 가스 공급부에 접속된 가스 공급관과, 상기 가스 공급관에 마련되는 복수의 밸브와, 상기 복수의 밸브의 사이에 마련된 복수의 압력 측정부를 갖는 가스 공급 시스템과, 상기 압력 측정부의 측정 결과 중, 적어도 1개 이상의 압력을 기초로, 상기 가스 공급관의 폐색 레벨을 판정 가능하게 구성된 제어부를 갖는 기술이 제공된다.