Composition for Cleaning of Semiconductor Substrate

The present invention provides a composition for cleaning a semiconductor substrate which comprises a water-insoluble polymer, a water-soluble polymer, and a solvent. The composition for cleaning a semiconductor substrate according to the present invention makes it easy to form a crack in a coating...

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Bibliographische Detailangaben
Hauptverfasser:	KWUN GIJIN, CHO YONGHWAN, CHUN JI MIN, AHN KYUSANG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention provides a composition for cleaning a semiconductor substrate which comprises a water-insoluble polymer, a water-soluble polymer, and a solvent. The composition for cleaning a semiconductor substrate according to the present invention makes it easy to form a crack in a coating film when cleaning with water and then can be cleaned without residue when cleaning with an organic solvent, and thus having excellent cleaning ability for an ultrafine particle. 본 발명은 비수용성 고분자, 수용성 고분자 및 용제를 포함하는 반도체 기판 세정용 조성물을 제공한다. 본 발명에 따른 반도체 기판 세정용 조성물은 물 세정시 세정용 도막에 크랙 형성이 용이하고 이후 유기용제 세정시 잔류물 없이 세정될 수 있어 초미립자에 대한 세정능력이 우수하다.