Etchant composition pre-composition for etchant and method for manufacturing the same
The present invention relates to an etchant composition including a fluorine-based compound which does not contain hydrofluoric acid (HF), a glycoside compound, and water and an oxidizing agent, and having pH of 3 to 8; a pre-composition for preparing the etchant composition; and a method for prepar...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to an etchant composition including a fluorine-based compound which does not contain hydrofluoric acid (HF), a glycoside compound, and water and an oxidizing agent, and having pH of 3 to 8; a pre-composition for preparing the etchant composition; and a method for preparing the etchant composition. According to the present invention, the etching speed with respect to a silicone germanium film can be improved.
본 발명은, 불산(HF)을 포함하지 않는 불소계 화합물; 글리코사이드 화합물; 물 및 산화제를 포함하며, pH가 3 내지 8인, 식각액 조성물, 상기 식각액 조성물 제조용 예비-조성물 및 상기 식각액 조성물 제조방법에 관한 것이다. |
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