Method of increasing nano patterned cylindrical mold using pattern transfer process
The present invention relates to a method for increasing an area of a nanopatterned cylindrical mold by using a pattern transfer process, capable of manufacturing a roll mold having a nanopattern used in a roll-to-roll imprint lithography process while increasing an area of a pattern region of a fla...
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| creator | KIM DOOIN KANG HOJU JEONG MYUNGYUNG |
| description | The present invention relates to a method for increasing an area of a nanopatterned cylindrical mold by using a pattern transfer process, capable of manufacturing a roll mold having a nanopattern used in a roll-to-roll imprint lithography process while increasing an area of a pattern region of a flat mold. The method includes: forming a pattern by using a pattern transfer process on a primary base roll by using a flat nano-stamp having a small size; fabricating a film in which an area of a pattern is increased so as to be widened along an x-axis by performing a roll-to-roll process by using the primary base roll that is patterned; performing the pattern transfer process on a secondary base roll by using a patterned film widened along the x-axis; fabricating the patterned film in which a pattern region is widened along a y-axis by using the roll-to-roll process by using the secondary base roll that is patterned, which is able to be used as a mold having a pattern width corresponding to a length widened along the x-axis; and performing the pattern transfer process by using the patterned film in which the pattern region is widened along the x-axis and the y-axis in the size of the nano-stamp.
본 발명은 평판형 금형의 패턴 영역을 대면적화 하여 롤투롤 임프린트 리소그래피 공정에 사용하는 나노 패턴을 갖는 롤 금형을 제조할 수 있도록 한 패턴전사 공정을 이용한 나노패턴 원통 금형 대면적화 방법에 관한 것으로, 작은 크기의 평판 Nano stamp를 이용하여 1차 base roll에 패턴 전사 공정을 이용하여 패턴을 형성하는 단계;패턴된 1차 base roll을 이용하여 롤투롤 공정을 수행하여 x축으로 넓어진 형태로 패턴의 대면적화가 이루어진 film을 생산하는 단계;x축으로 넓어진 패턴된 film을 이용하여 2차 base roll에 패턴 전사 공정을 수행하는 단계;패터닝이 완료된 2차 base roll은 x축으로 넓어진 길이 만큼 패턴 넓이를 가지는 금형으로 사용이 가능한 것을 이용하여 롤투롤 공정을 이용하여 y축으로 패턴 영역이 넓어진 패턴된 film을 생산하는 단계;nano stamp의 크기에서 x축과 y축으로 패턴 영역이 넓혀진 패턴된 film을 이용하여 패턴 전사 공정을 수행하는 단계;를 포함하는 것이다. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20220025981A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20220025981A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20220025981A3</originalsourceid><addsrcrecordid>eNqNyjEKQjEMANC_OIh6h4CzUCuCjiKKIC7q_gltqoWalKQO3l6QfwCnt7xxd7tQe0oESZA5KKFlfgAjC1RsjZQpQviUzFFzwAIvKRHevzUEaIpsiRSqSiCzaTdKWIxmg5Nufjzc96cFVenJKgZiav356p33zvn1drPcrf5bX3oKOeI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method of increasing nano patterned cylindrical mold using pattern transfer process</title><source>esp@cenet</source><creator>KIM DOOIN ; KANG HOJU ; JEONG MYUNGYUNG</creator><creatorcontrib>KIM DOOIN ; KANG HOJU ; JEONG MYUNGYUNG</creatorcontrib><description>The present invention relates to a method for increasing an area of a nanopatterned cylindrical mold by using a pattern transfer process, capable of manufacturing a roll mold having a nanopattern used in a roll-to-roll imprint lithography process while increasing an area of a pattern region of a flat mold. The method includes: forming a pattern by using a pattern transfer process on a primary base roll by using a flat nano-stamp having a small size; fabricating a film in which an area of a pattern is increased so as to be widened along an x-axis by performing a roll-to-roll process by using the primary base roll that is patterned; performing the pattern transfer process on a secondary base roll by using a patterned film widened along the x-axis; fabricating the patterned film in which a pattern region is widened along a y-axis by using the roll-to-roll process by using the secondary base roll that is patterned, which is able to be used as a mold having a pattern width corresponding to a length widened along the x-axis; and performing the pattern transfer process by using the patterned film in which the pattern region is widened along the x-axis and the y-axis in the size of the nano-stamp.
본 발명은 평판형 금형의 패턴 영역을 대면적화 하여 롤투롤 임프린트 리소그래피 공정에 사용하는 나노 패턴을 갖는 롤 금형을 제조할 수 있도록 한 패턴전사 공정을 이용한 나노패턴 원통 금형 대면적화 방법에 관한 것으로, 작은 크기의 평판 Nano stamp를 이용하여 1차 base roll에 패턴 전사 공정을 이용하여 패턴을 형성하는 단계;패턴된 1차 base roll을 이용하여 롤투롤 공정을 수행하여 x축으로 넓어진 형태로 패턴의 대면적화가 이루어진 film을 생산하는 단계;x축으로 넓어진 패턴된 film을 이용하여 2차 base roll에 패턴 전사 공정을 수행하는 단계;패터닝이 완료된 2차 base roll은 x축으로 넓어진 길이 만큼 패턴 넓이를 가지는 금형으로 사용이 가능한 것을 이용하여 롤투롤 공정을 이용하여 y축으로 패턴 영역이 넓어진 패턴된 film을 생산하는 단계;nano stamp의 크기에서 x축과 y축으로 패턴 영역이 넓혀진 패턴된 film을 이용하여 패턴 전사 공정을 수행하는 단계;를 포함하는 것이다.</description><language>eng ; kor</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220304&DB=EPODOC&CC=KR&NR=20220025981A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220304&DB=EPODOC&CC=KR&NR=20220025981A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM DOOIN</creatorcontrib><creatorcontrib>KANG HOJU</creatorcontrib><creatorcontrib>JEONG MYUNGYUNG</creatorcontrib><title>Method of increasing nano patterned cylindrical mold using pattern transfer process</title><description>The present invention relates to a method for increasing an area of a nanopatterned cylindrical mold by using a pattern transfer process, capable of manufacturing a roll mold having a nanopattern used in a roll-to-roll imprint lithography process while increasing an area of a pattern region of a flat mold. The method includes: forming a pattern by using a pattern transfer process on a primary base roll by using a flat nano-stamp having a small size; fabricating a film in which an area of a pattern is increased so as to be widened along an x-axis by performing a roll-to-roll process by using the primary base roll that is patterned; performing the pattern transfer process on a secondary base roll by using a patterned film widened along the x-axis; fabricating the patterned film in which a pattern region is widened along a y-axis by using the roll-to-roll process by using the secondary base roll that is patterned, which is able to be used as a mold having a pattern width corresponding to a length widened along the x-axis; and performing the pattern transfer process by using the patterned film in which the pattern region is widened along the x-axis and the y-axis in the size of the nano-stamp.
본 발명은 평판형 금형의 패턴 영역을 대면적화 하여 롤투롤 임프린트 리소그래피 공정에 사용하는 나노 패턴을 갖는 롤 금형을 제조할 수 있도록 한 패턴전사 공정을 이용한 나노패턴 원통 금형 대면적화 방법에 관한 것으로, 작은 크기의 평판 Nano stamp를 이용하여 1차 base roll에 패턴 전사 공정을 이용하여 패턴을 형성하는 단계;패턴된 1차 base roll을 이용하여 롤투롤 공정을 수행하여 x축으로 넓어진 형태로 패턴의 대면적화가 이루어진 film을 생산하는 단계;x축으로 넓어진 패턴된 film을 이용하여 2차 base roll에 패턴 전사 공정을 수행하는 단계;패터닝이 완료된 2차 base roll은 x축으로 넓어진 길이 만큼 패턴 넓이를 가지는 금형으로 사용이 가능한 것을 이용하여 롤투롤 공정을 이용하여 y축으로 패턴 영역이 넓어진 패턴된 film을 생산하는 단계;nano stamp의 크기에서 x축과 y축으로 패턴 영역이 넓혀진 패턴된 film을 이용하여 패턴 전사 공정을 수행하는 단계;를 포함하는 것이다.</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEKQjEMANC_OIh6h4CzUCuCjiKKIC7q_gltqoWalKQO3l6QfwCnt7xxd7tQe0oESZA5KKFlfgAjC1RsjZQpQviUzFFzwAIvKRHevzUEaIpsiRSqSiCzaTdKWIxmg5Nufjzc96cFVenJKgZiav356p33zvn1drPcrf5bX3oKOeI</recordid><startdate>20220304</startdate><enddate>20220304</enddate><creator>KIM DOOIN</creator><creator>KANG HOJU</creator><creator>JEONG MYUNGYUNG</creator><scope>EVB</scope></search><sort><creationdate>20220304</creationdate><title>Method of increasing nano patterned cylindrical mold using pattern transfer process</title><author>KIM DOOIN ; KANG HOJU ; JEONG MYUNGYUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220025981A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2022</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM DOOIN</creatorcontrib><creatorcontrib>KANG HOJU</creatorcontrib><creatorcontrib>JEONG MYUNGYUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM DOOIN</au><au>KANG HOJU</au><au>JEONG MYUNGYUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of increasing nano patterned cylindrical mold using pattern transfer process</title><date>2022-03-04</date><risdate>2022</risdate><abstract>The present invention relates to a method for increasing an area of a nanopatterned cylindrical mold by using a pattern transfer process, capable of manufacturing a roll mold having a nanopattern used in a roll-to-roll imprint lithography process while increasing an area of a pattern region of a flat mold. The method includes: forming a pattern by using a pattern transfer process on a primary base roll by using a flat nano-stamp having a small size; fabricating a film in which an area of a pattern is increased so as to be widened along an x-axis by performing a roll-to-roll process by using the primary base roll that is patterned; performing the pattern transfer process on a secondary base roll by using a patterned film widened along the x-axis; fabricating the patterned film in which a pattern region is widened along a y-axis by using the roll-to-roll process by using the secondary base roll that is patterned, which is able to be used as a mold having a pattern width corresponding to a length widened along the x-axis; and performing the pattern transfer process by using the patterned film in which the pattern region is widened along the x-axis and the y-axis in the size of the nano-stamp.
본 발명은 평판형 금형의 패턴 영역을 대면적화 하여 롤투롤 임프린트 리소그래피 공정에 사용하는 나노 패턴을 갖는 롤 금형을 제조할 수 있도록 한 패턴전사 공정을 이용한 나노패턴 원통 금형 대면적화 방법에 관한 것으로, 작은 크기의 평판 Nano stamp를 이용하여 1차 base roll에 패턴 전사 공정을 이용하여 패턴을 형성하는 단계;패턴된 1차 base roll을 이용하여 롤투롤 공정을 수행하여 x축으로 넓어진 형태로 패턴의 대면적화가 이루어진 film을 생산하는 단계;x축으로 넓어진 패턴된 film을 이용하여 2차 base roll에 패턴 전사 공정을 수행하는 단계;패터닝이 완료된 2차 base roll은 x축으로 넓어진 길이 만큼 패턴 넓이를 가지는 금형으로 사용이 가능한 것을 이용하여 롤투롤 공정을 이용하여 y축으로 패턴 영역이 넓어진 패턴된 film을 생산하는 단계;nano stamp의 크기에서 x축과 y축으로 패턴 영역이 넓혀진 패턴된 film을 이용하여 패턴 전사 공정을 수행하는 단계;를 포함하는 것이다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | Method of increasing nano patterned cylindrical mold using pattern transfer process |
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