Susceptor Substrate Support Member Apparatus for Processing Substrate Including Susceptor and Substrate Support Member Method of Manufacturing Susceptor and Method of Manufacturing Substrate Support Member

The present invention relates to a susceptor, a substrate support part, a substrate processing apparatus including the susceptor and the substrate support part, a method of manufacturing the susceptor, and a method of manufacturing the substrate support part. The susceptor includes: a base for suppo...

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Bibliographische Detailangaben
Hauptverfasser:	SU YOUNG KWON, PARK SANG HWA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a susceptor, a substrate support part, a substrate processing apparatus including the susceptor and the substrate support part, a method of manufacturing the susceptor, and a method of manufacturing the substrate support part. The susceptor includes: a base for supporting a substrate; and a coating layer formed on the base and configured to mount the substrate. The coating layer includes a first coating layer for supporting the substrate, and a second coating layer formed to surround the side surface of the substrate. The base includes a base support surface for supporting the first coating layer, and a base inclination surface connected to the base support surface. The included angle between the first coating layer and the second coating layer is formed to be smaller than the included angle between the base support surface and the base inclination surface. 본 발명은 기판을 지지하기 위한 베이스; 및 상기 베이스 상에 형성되고, 상기 기판이 안착되기 위한 코팅층을 포함하고, 상기 코팅층은 상기 기판을 지지하는 제1코팅층, 및 상기 기판의 측면(側面)을 둘러싸도록 형성된 제2코팅층을 포함하며, 상기 베이스는 상기 제1코팅층을 지지하는 베이스지지면, 및 상기 베이스지지면에 연결된 베이스경사면을 포함하며, 상기 제1코팅층과 상기 제2코팅층 사이의 끼인각은 상기 베이스지지면과 상기 베이스경사면 사이의 끼인각에 비해 더 작게 형성된 서셉터, 기판지지부, 서셉터와 기판지지부를 포함하는 기판처리장치, 서셉터 제조방법, 및 기판지지부 제조방법에 관한 것이다.