SUPPORT UNIT SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

The present invention provides a support unit. The support unit for supporting a substrate includes a heating member and a reflective plate. The reflective plate may include a curved surface which reflects thermal energy generated by a heating member to an edge region of the substrate. The substrate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LEE YOUNGIL, CHOI JUNGBONG, YUN KANGSEOP
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	The present invention provides a support unit. The support unit for supporting a substrate includes a heating member and a reflective plate. The reflective plate may include a curved surface which reflects thermal energy generated by a heating member to an edge region of the substrate. The substrate can be efficiently processed. 본 발명은 지지 유닛을 제공한다. 기판을 지지하는 지지 유닛은, 가열 부재 및 반사 판을 포함하고, 상기 반사 판은, 상기 가열 부재가 발생시키는 열 에너지를 상기 기판의 가장자리 영역으로 반사시키는 곡면을 포함할 수 있다.