증가된 결정질의 조밀한 개선된 코팅의 생성 방법

증가된 결정도 및 밀도를 갖는 개선된 코팅을 형성하기 위한 신규한 공정이 제공된다. 본 공정은 별도의 보조 가열 또는 후열 처리 단계의 사용 없이 코팅을 형성하기 위해 층류 플라즈마 플룸을 이용하는 단계를 포함한다. Novel processes for forming improved coatings with increased crystallinity and density are provided. The process includes utilizing a laminar plasma plume to form the coatings wit...

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Bibliographische Detailangaben
Hauptverfasser:	OCONNOR MOLLY M, SWEET MARSHALL L
Format:	Patent
Sprache:	kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	증가된 결정도 및 밀도를 갖는 개선된 코팅을 형성하기 위한 신규한 공정이 제공된다. 본 공정은 별도의 보조 가열 또는 후열 처리 단계의 사용 없이 코팅을 형성하기 위해 층류 플라즈마 플룸을 이용하는 단계를 포함한다. Novel processes for forming improved coatings with increased crystallinity and density are provided. The process includes utilizing a laminar plasma plume to form the coatings without use of a separate auxiliary heating or post heat treatment step.