RESIST COMPOSITION METHOD OF FORMING RESIST PATTERN COMPOUND AND RESIN

Disclosed is a resist composition containing a resin component (A1) whose solubility in a developer changes due to the action of an acid, wherein the resin component (A1) has a structural unit (a01) derived from a compound represented by general formula (a01-1). In the formula, W^01 is a polymerizab...

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Bibliographische Detailangaben
Hauptverfasser:	ONISHI KOSHI, TODOROKI SEIJI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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