NEW PEEK NOVOLAC POLYMER

The present invention relates to a novolak polymer comprising an etheretherketone functional group and a hard mask composition containing a hard mask composition comprising the same. The hard mask composition satisfies etching resistance, solubility, and flatness. 본 발명은 에테르에테르케톤 관능기를 포함하는 노볼락폴리머 및 이...

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Bibliographische Detailangaben
Hauptverfasser:	LEE YONGARM, YOO HYUNA, CHO SANGHO, CHOI HANYOUNG, NOH HYEONGMIN, CHO CHANGHO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a novolak polymer comprising an etheretherketone functional group and a hard mask composition containing a hard mask composition comprising the same. The hard mask composition satisfies etching resistance, solubility, and flatness. 본 발명은 에테르에테르케톤 관능기를 포함하는 노볼락폴리머 및 이를 포함하는 하드마스크용 조성물을 함유하는 하드마스크 조성물에 관한 것으로, 내에칭성과 용해성 및 평탄성을 만족하는 것을 특징으로 한다.