Substrate processing apparatus

The present invention relates to a substrate processing device. More specifically, the present invention relates to the substrate processing device that can be used stably even when a substrate is enlarged and can provide a plasma with an improved uniformity to a processing surface of the substrate....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JEONG HONG KI, JANG WOO YEONG, LEE JAE SEUNG, KIM JUN HO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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