Al Al ALLOY DEPOSITION FILM WIRING FILM FOR DISPLAY DISPLAY DEVICE AND SPUTTERING TARGET

According to one embodiment of the present invention, an Al alloy deposition film includes 1.5-6.0 atm% of Al, Zr, or Zn. A ratio of an electric resistivity before a bending test to an electric resistivity after performing ten thousand times of the tests is equal to or less than 1.1 and a ratio of t...

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Bibliographische Detailangaben
Hauptverfasser:	OCHI MOTOTAKA, KURA CHIHARU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL FREQUENCY-CHANGING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	According to one embodiment of the present invention, an Al alloy deposition film includes 1.5-6.0 atm% of Al, Zr, or Zn. A ratio of an electric resistivity before a bending test to an electric resistivity after performing ten thousand times of the tests is equal to or less than 1.1 and a ratio of the electric resistivity before a bending test to an electric resistivity after hundred thousand times of the tests is equal to or less than 1.3. The present invention provides a wiring film for display and a display apparatus, which have the Al alloy deposition film and a sputtering target for forming the Al alloy deposition film. The present invention provides the Al alloy deposition rate with excellent bending resistance. 본 발명의 일 양태에 관한 Al 합금 증착막은, Al과, Zr 또는 Zn을 1.5 내지 6.0atm％ 포함하고, 굴곡 시험을 행하기 전의 전기 저항률에 대한 동 시험을 1만회 행한 후의 전기 저항률의 비가 1.1 이하이고, 또한 상기 굴곡 시험을 행하기 전의 전기 저항률에 대한 동 시험을 10만회 행한 후의 전기 저항률의 비가 1.3 이하이다. 이 Al 합금 증착막을 구비하는 디스플레이용 배선막과 디스플레이 장치, 그리고 Al 합금 증착막 형성용의 스퍼터링 타깃.