EXHAUST DEVICE FOR SUBSTRATE PROCESSING DEVICE

The present invention relates to an exhaust device for substrate processing which comprises: a chamber unit; a base unit mounted on the chamber unit; a spindle unit mounted on the base unit; a table unit mounted on the spindle to be rotatable and configured to rotate a seated substrate; a cup unit m...

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Bibliographische Detailangaben
Hauptverfasser:	KIM NAM JIN, BAEK SEUNG DAE, KIM SUNG YUP
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	The present invention relates to an exhaust device for substrate processing which comprises: a chamber unit; a base unit mounted on the chamber unit; a spindle unit mounted on the base unit; a table unit mounted on the spindle to be rotatable and configured to rotate a seated substrate; a cup unit mounted on the base unit and inducing separation and collection of a chemical liquid, sprayed onto the substrate, for each component; and an internal exhaust unit disposed between the spindle unit and the cup unit to discharge a fluid, thereby preventing damage to the substrate due to a suspended matter. 본 발명은 기판 처리용 배기장치에 관한 것으로, 챔버부와, 챔버부에 장착되는 베이스부와, 베이스부에 장착되는 스핀들부와, 스핀들부에 장착되어 회전 가능하고 안착된 기판을 회전시키는 테이블부와, 베이스부에 장착되고 기판에 분사되는 약액을 성분별로 분리 수거하도록 유도하는 컵부와, 스핀들부와 컵부 사이에 배치되어 유체를 배출하는 내부배기부를 포함하여, 부유물질에 의한 기판 손상을 방지할 수 있다.