METHOD AND APPARATUS FOR MAINTAINING VACUUM OF CHAMBER

The present invention relates to a method and an apparatus for maintaining a vacuum of a chamber, which ensure high reliability by maintaining a constant vacuum during a process through a vacuum pump unit connected to a reaction chamber and a bypass unit branching from the vacuum pump unit to bypass...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	CHUNG HA SUK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to a method and an apparatus for maintaining a vacuum of a chamber, which ensure high reliability by maintaining a constant vacuum during a process through a vacuum pump unit connected to a reaction chamber and a bypass unit branching from the vacuum pump unit to bypass gas and rejoining the vacuum pump unit. 본 발명은 챔버 진공유지방법 및 진공유지장치에 관한 것으로, 반응챔버에 연결되는 진공펌프부 및 진공펌프부에서 분기되어 가스가 우회이동하고, 상기 진공펌프부로 다시 합류하는 바이패스부를 통해 공정 과정 중에 일정한 진공을 유지하여 신뢰성이 높은 챔버 진공유지방법 및 진공유지장치를 제공한다.