SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE

According to an embodiment of the present invention, a semiconductor device manufacturing method includes the following steps of: forming a first stacked structure including first interlayer insulating layers and first horizontal sacrificial layers alternately and repeatedly stacked on a substrate;...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PARK BYUNG GON, CHEON JI SUNG, CHOI JUN YOUNG, LIM JIN SOO, HONG SUK BUM
Format: Patent
Sprache:eng ; kor
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