Variable resistance memory device

According to the present invention, a semiconductor device and a variable resistance memory device are provided. According to embodiments, the variable resistance memory device comprises memory cells horizontally arranged on a substrate, wherein each of the memory cells includes a selection element...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE JINWOO, YU SEUNG GEUN, AN GWANGGUK, PARK KWANGMIN, LEE JA BIN, WU ZHE, AHN DONGHO
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:According to the present invention, a semiconductor device and a variable resistance memory device are provided. According to embodiments, the variable resistance memory device comprises memory cells horizontally arranged on a substrate, wherein each of the memory cells includes a selection element pattern and a variable resistance pattern vertically stacked on the substrate. The selection element pattern comprises: a first selection element pattern including a chalcogenide material; and a metal oxide and may include a second selection element pattern bonded to the first selection element pattern. 본 발명에 따르면, 반도체 장치 및 가변 저항 메모리 장치가 제공된다. 실시예들에 따르면, 가변 저항 메모리 장치는 기판 상에 수평적으로 배열된 메모리 셀들을 포함하되, 상기 메모리 셀들의 각각은 상기 기판 상에 수직하게 적층된 선택 소자 패턴 및 가변 저항 패턴을 포함하고, 상기 선택 소자 패턴은: 칼코게나이드(chalcogenide) 물질을 포함하는 제1 선택 소자 패턴; 및 금속 산화물을 포함하고, 상기 제1 선택 소자 패턴과 접합하는 제2 선택 소자 패턴을 포함할 수 있다.