POLYMER RESIN COMPOUND METHOD FOR PREPARING SAME AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING SAME

Provided are a polymer resin compound, a manufacturing method thereof, and a photosensitive resin composition comprising the polymer resin compound and a photosensitive material formed using the photosensitive resin composition. The method comprises a step of mixing a polymerization composition comp...

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Bibliographische Detailangaben
Hauptverfasser:	YOON MISUN, CHUN SUNG HO, LIM MINYOUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided are a polymer resin compound, a manufacturing method thereof, and a photosensitive resin composition comprising the polymer resin compound and a photosensitive material formed using the photosensitive resin composition. The method comprises a step of mixing a polymerization composition comprising a first compound represented by a chemical formula 1 and a second compound represented by a chemical formula 2, and a polymer resin compound according to an exemplary embodiment is capable of thermal crosslinking, has excellent compatibility and solubility, and has the advantage of easy structural deformation. 본 명세서는 고분자 수지 화합물, 이의 제조 방법, 상기 고분자 수지 화합물을 포함하는 감광성 수지 조성물 및 상기 감광성 수지 조성물을 이용하여 형성된 감광재를 제공한다.