Flexible copper clad laminate electronic device including the same and method for manufacturing the flexible copper clad laminate
Disclosed are a flexible copper-clad laminated film, an electronic device including the same, and a manufacturing method of the flexible copper-clad laminated film. The flexible copper-clad laminated film comprises: a non-conductive polymer substrate; a nickel-containing plating layer located on at...
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creator | LEE YONG HO JEONG WOO DEUK LEE JEONG DEOK |
description | Disclosed are a flexible copper-clad laminated film, an electronic device including the same, and a manufacturing method of the flexible copper-clad laminated film. The flexible copper-clad laminated film comprises: a non-conductive polymer substrate; a nickel-containing plating layer located on at least one surface of the substrate; and a copper plating layer positioned on the nickel-containing plating layer. The copper plating layer may have a rate of change of full width at half maximum calculated by Equation 1 below with respect to the peak of the plane (111) in the X-ray diffraction spectrum of 0.01° or less. Equation 1 is full width at half maximum (111) change rate = {(full width at half maximum after leaving for 60 days) - (initial full width at half maximum)}.
연성동박 적층필름, 이를 포함하는 전자 소자, 및 상기 연성동박 적층필름의 제작방법이 개시된다. 상기 연성동박 적층필름은 비전도성 고분자 기재; 상기 기재의 적어도 일 면에 위치한 니켈함유 도금층; 상기 니켈함유 도금층 상에 위치한 구리 도금층;을 포함하고, 상기 구리 도금층은 X-선 회절 스펙트럼에서 (111)면의 피크에 대한 하기 수학식 1에 의해 계산된 반치폭 변동률이 0.01°이하일 수 있다 반치폭(111) 변동률 = {(60일 간 방치한 후 반치폭) - (초기 반치폭)} |
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연성동박 적층필름, 이를 포함하는 전자 소자, 및 상기 연성동박 적층필름의 제작방법이 개시된다. 상기 연성동박 적층필름은 비전도성 고분자 기재; 상기 기재의 적어도 일 면에 위치한 니켈함유 도금층; 상기 니켈함유 도금층 상에 위치한 구리 도금층;을 포함하고, 상기 구리 도금층은 X-선 회절 스펙트럼에서 (111)면의 피크에 대한 하기 수학식 1에 의해 계산된 반치폭 변동률이 0.01°이하일 수 있다 <수학식 1> 반치폭(111) 변동률 = {(60일 간 방치한 후 반치폭) - (초기 반치폭)}</description><language>eng ; kor</language><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; PERFORMING OPERATIONS ; PRINTED CIRCUITS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210630&DB=EPODOC&CC=KR&NR=20210079607A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210630&DB=EPODOC&CC=KR&NR=20210079607A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE YONG HO</creatorcontrib><creatorcontrib>JEONG WOO DEUK</creatorcontrib><creatorcontrib>LEE JEONG DEOK</creatorcontrib><title>Flexible copper clad laminate electronic device including the same and method for manufacturing the flexible copper clad laminate</title><description>Disclosed are a flexible copper-clad laminated film, an electronic device including the same, and a manufacturing method of the flexible copper-clad laminated film. The flexible copper-clad laminated film comprises: a non-conductive polymer substrate; a nickel-containing plating layer located on at least one surface of the substrate; and a copper plating layer positioned on the nickel-containing plating layer. The copper plating layer may have a rate of change of full width at half maximum calculated by Equation 1 below with respect to the peak of the plane (111) in the X-ray diffraction spectrum of 0.01° or less. Equation 1 is full width at half maximum (111) change rate = {(full width at half maximum after leaving for 60 days) - (initial full width at half maximum)}.
연성동박 적층필름, 이를 포함하는 전자 소자, 및 상기 연성동박 적층필름의 제작방법이 개시된다. 상기 연성동박 적층필름은 비전도성 고분자 기재; 상기 기재의 적어도 일 면에 위치한 니켈함유 도금층; 상기 니켈함유 도금층 상에 위치한 구리 도금층;을 포함하고, 상기 구리 도금층은 X-선 회절 스펙트럼에서 (111)면의 피크에 대한 하기 수학식 1에 의해 계산된 반치폭 변동률이 0.01°이하일 수 있다 <수학식 1> 반치폭(111) 변동률 = {(60일 간 방치한 후 반치폭) - (초기 반치폭)}</description><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PRINTED CIRCUITS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzb0KwjAUhuEuDqLewwFnIVawOIpYBDdxL8eTLzaQP9JUXL1zF13F6V0eeKfVq3V42psDSUwJmcSxJsfeBi4gOEjJMVghjYcVkA3iRm3DnUoPGtiDOGjyKH3UZGImz2E0LGXMX2V-PebVxLAbsPh0Vi3b4_VwWiHFDkNiQUDpzpda1Wulmt1WNfvNf-oNvPpKmg</recordid><startdate>20210630</startdate><enddate>20210630</enddate><creator>LEE YONG HO</creator><creator>JEONG WOO DEUK</creator><creator>LEE JEONG DEOK</creator><scope>EVB</scope></search><sort><creationdate>20210630</creationdate><title>Flexible copper clad laminate electronic device including the same and method for manufacturing the flexible copper clad laminate</title><author>LEE YONG HO ; JEONG WOO DEUK ; LEE JEONG DEOK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20210079607A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2021</creationdate><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PRINTED CIRCUITS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE YONG HO</creatorcontrib><creatorcontrib>JEONG WOO DEUK</creatorcontrib><creatorcontrib>LEE JEONG DEOK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE YONG HO</au><au>JEONG WOO DEUK</au><au>LEE JEONG DEOK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Flexible copper clad laminate electronic device including the same and method for manufacturing the flexible copper clad laminate</title><date>2021-06-30</date><risdate>2021</risdate><abstract>Disclosed are a flexible copper-clad laminated film, an electronic device including the same, and a manufacturing method of the flexible copper-clad laminated film. The flexible copper-clad laminated film comprises: a non-conductive polymer substrate; a nickel-containing plating layer located on at least one surface of the substrate; and a copper plating layer positioned on the nickel-containing plating layer. The copper plating layer may have a rate of change of full width at half maximum calculated by Equation 1 below with respect to the peak of the plane (111) in the X-ray diffraction spectrum of 0.01° or less. Equation 1 is full width at half maximum (111) change rate = {(full width at half maximum after leaving for 60 days) - (initial full width at half maximum)}.
연성동박 적층필름, 이를 포함하는 전자 소자, 및 상기 연성동박 적층필름의 제작방법이 개시된다. 상기 연성동박 적층필름은 비전도성 고분자 기재; 상기 기재의 적어도 일 면에 위치한 니켈함유 도금층; 상기 니켈함유 도금층 상에 위치한 구리 도금층;을 포함하고, 상기 구리 도금층은 X-선 회절 스펙트럼에서 (111)면의 피크에 대한 하기 수학식 1에 의해 계산된 반치폭 변동률이 0.01°이하일 수 있다 <수학식 1> 반치폭(111) 변동률 = {(60일 간 방치한 후 반치폭) - (초기 반치폭)}</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PERFORMING OPERATIONS PRINTED CIRCUITS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
title | Flexible copper clad laminate electronic device including the same and method for manufacturing the flexible copper clad laminate |
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