SEMICONDUCTOR DEVICES

The present invention relates to a semiconductor device, which comprises: a first semiconductor pattern protruding from a substrate in a direction vertical to an upper surface of the substrate to serve as a channel; a first conductive pattern for surrounding an upper sidewall of the first semiconduc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YUN SEUNG CHAN, HAN DONG HWAN
Format: Patent
Sprache:eng ; kor
Schlagworte:
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