polyamine polymer of bis-indole compound

The present invention relates to a hard mask composition using a polyamine polymer manufactured from a bisindole compound, and to a hard mask polymer that simultaneously satisfies solubility, etch resistance, and heat resistance. The present invention provides a polymer for the hard mask comprising...

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Bibliographische Detailangaben
Hauptverfasser:	CHO SANGHO, CHOI HANYOUNG, NOH HYEONGMIN, CHO CHANGHO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a hard mask composition using a polyamine polymer manufactured from a bisindole compound, and to a hard mask polymer that simultaneously satisfies solubility, etch resistance, and heat resistance. The present invention provides a polymer for the hard mask comprising a repeating unit represented by chemical formula 1. 본 발명은 비스인돌화합물로 부터 제조되어지는 폴리아민 폴리머를 이용한 하드마스크 조성물에 관한 것으로, 용해성과 내에칭성 및 내열성을 동시에 만족하는 하드마스크용 폴리머에 관한 것이다.