condensation polymer of bisnaphtholfluorene and pyrimidine

The present invention relates to a hard mask composition comprising a condensation polymer of bisnaphthol fluorene and pyrimidine, which satisfies heat resistance and etch resistance simultaneously. 비스나프톨플루오렌과 피리미딘의 축합 폴리머를 포함하는 하드마스크 조성물에 관한 것으로 , 내열성과 내에칭성이 동시에 만족되는 것을 특징으로 한다....

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Bibliographische Detailangaben
Hauptverfasser:	CHO SANGHO, CHOI HANYOUNG, NOH HYEONGMIN, CHO CHANGHO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a hard mask composition comprising a condensation polymer of bisnaphthol fluorene and pyrimidine, which satisfies heat resistance and etch resistance simultaneously. 비스나프톨플루오렌과 피리미딘의 축합 폴리머를 포함하는 하드마스크 조성물에 관한 것으로 , 내열성과 내에칭성이 동시에 만족되는 것을 특징으로 한다.