Electro-static chuck and substrate processing apparatus including the same

According to one embodiment of the present invention, an electrostatic chuck comprises: a chuck plate configured to seat a substrate; an insulating pillar on the outside of the chuck plate and having a pin hole; a first moving ring surrounding a side of the chuck plate on the insulating pillar; a se...

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Bibliographische Detailangaben
Hauptverfasser:	KIM KEON WOO, YEO DONG YUN, JEONG KYEONG SEOK, SHIN SEUNG WON, KIM HAK YOUNG, MIN HEE WON, KIM BYEONG SANG, BANG KYEONG TEA, LEE HYAN JUNG, KIM EUNG SU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TRANSPORTING
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