Electro-static chuck and substrate processing apparatus including the same

According to one embodiment of the present invention, an electrostatic chuck comprises: a chuck plate configured to seat a substrate; an insulating pillar on the outside of the chuck plate and having a pin hole; a first moving ring surrounding a side of the chuck plate on the insulating pillar; a se...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KIM KEON WOO, YEO DONG YUN, JEONG KYEONG SEOK, SHIN SEUNG WON, KIM HAK YOUNG, MIN HEE WON, KIM BYEONG SANG, BANG KYEONG TEA, LEE HYAN JUNG, KIM EUNG SU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	According to one embodiment of the present invention, an electrostatic chuck comprises: a chuck plate configured to seat a substrate; an insulating pillar on the outside of the chuck plate and having a pin hole; a first moving ring surrounding a side of the chuck plate on the insulating pillar; a second moving ring covering at least a portion of the top of the first moving ring; and a driving pin configured to be movable in a vertical direction in the pin hole of the insulating pillar and vertically overlapped with at least a portion of the first moving ring and at least a portion of the second moving ring, wherein the driving pin is configured to either drive the first moving ring and the second moving ring together in a vertical direction, or drive the second moving ring in the vertical direction. Therefore, the damage to the chuck plate due to plasma can be prevented. 본 개시의 일 실시예에 따른 정전 척은 기판을 안착시키도록 구성된 척 플레이트; 상기 척 플레이트의 외측에 있고, 핀 홀이 형성된 절연 기둥; 상기 절연 기둥 상에서 상기 척 플레이트의 측부를 둘러싸는 제1 이동 링; 상기 제1 이동 링의 상부의 적어도 일부를 덮는 제2 이동 링; 및 상기 절연 기둥의 상기 핀 홀에서 수직 방향으로 이동 가능하게 구성되고, 상기 제1 이동 링의 적어도 일부 및 상기 제2 이동 링의 적어도 일부와 수직 방향으로 중첩된 구동 핀;을 포함하고, 상기 구동 핀은, 상기 제1 이동 링 및 상기 제2 이동 링을 함께 수직 방향으로 구동시키거나, 상기 제2 이동 링을 수직 방향으로 구동시키도록 구성된 것을 특징으로 한다.