Novel silylcyclodisilazane compoundmethod for manufacturing thereof andsilicon-containing thin film use the same

The present invention relates to a novel silylcyclodisilazane compound represented by chemical formula 1, a composition for depositing a silicon-containing thin film comprising the same, and a method for manufacturing a silicon-containing thin film using the same. The silylcyclodisilazane compound o...

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Bibliographische Detailangaben
Hauptverfasser:	PARK JEONG JOO, KIM SUNG GI, LIM HAENG DON, LEE SANG ICK, KWONE YONG HEE, KIM YEONG HUN, JEON SANG YONG, BYUN TAE SEOK, JANG SE JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a novel silylcyclodisilazane compound represented by chemical formula 1, a composition for depositing a silicon-containing thin film comprising the same, and a method for manufacturing a silicon-containing thin film using the same. The silylcyclodisilazane compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus can be used as a silicon-containing precursor to produce a high-quality silicon-containing thin film by various deposition methods. 본 발명은 신규한 실릴사이클로다이실라잔 화합물, 이를 포함하는 실리콘 함유 박막 증착용 조성물 및 이를 이용한 실리콘 함유 박막의 제조방법에 관한 것으로, 본 발명의 실릴사이클로다이실라잔 화합물은 반응성이 뛰어나며 열적으로 안정하고 휘발성이 높아 실리콘 함유 전구체로 사용되어 다양한 증착방법으로 양질의 실리콘 함유 박막을 제조할 수 있다.