세라믹 코팅을 컨디셔닝하기 위한 방법

플라즈마 프로세싱 챔버에서 사용하는 부품 상의 세라믹 코팅을 컨디셔닝하기 위한 방법이 제공된다. 세라믹 코팅은 용액으로 습윤되고, 용액은 용매를 전해질과 혼합함으로써 형성되고, 전해질의 1 ％ 내지 10 ％가 용액에 해리된다. 세라믹 코팅이 입자들로 블라스팅된다. 세라믹 코팅이 린싱된다. A method for conditioning ceramic coating on a part for use in a plasma processing chamber is provided. The ceramic coating is wetted with...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BIN XIAOMIN, OUTKA DUANE, SHIH HONG, PILGRIM GREGORY A, HUNDI GIRISH M, PAPE ERIC A, LA CROIX CLIFF
Format:	Patent
Sprache:	kor
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GRINDING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS POLISHING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	플라즈마 프로세싱 챔버에서 사용하는 부품 상의 세라믹 코팅을 컨디셔닝하기 위한 방법이 제공된다. 세라믹 코팅은 용액으로 습윤되고, 용액은 용매를 전해질과 혼합함으로써 형성되고, 전해질의 1 ％ 내지 10 ％가 용액에 해리된다. 세라믹 코팅이 입자들로 블라스팅된다. 세라믹 코팅이 린싱된다. A method for conditioning ceramic coating on a part for use in a plasma processing chamber is provided. The ceramic coating is wetted with a solution, wherein the solution is formed by mixing a solvent with an electrolyte, wherein from 1% to 10% of the electrolyte dissociates in the solution. The ceramic coating is blasted with particles. The ceramic coating is rinsed.