Method for depositing tungsten thin film

A tungsten thin film deposition method according to an embodiment of the present invention includes the steps of: forming a nucleation layer on a substrate by alternately supplying precursor gas and reaction gas into a process chamber in a vacuum atmosphere; and supplying hydrogen-containing gas int...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM DONG WOO, HAN TAE SUNG, SUN WOO HOON, YOON WON JUN, CHOI SEOK KYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!