APPARATUS FOR PROCESSING SUBSTRATE AND PROCESSING METHOD OF SUBSTRATE

The present invention is to provide a substrate processing apparatus and a substrate processing method with improved process efficiency. According to the present invention, the substrate processing apparatus comprises: a chamber partitioned into a first moving space, a second moving space, and a pro...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM TAEHUN, LIM JAEHA, KIM DOHWAN, HAN GYEONGHEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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