SUBSTRATE PROCESSING DEVICE
The present invention relates to a substrate processing device which comprises: a base unit having a ring shape to form a space for arranging a process module therein; a plurality of support units mounted along a circumferential length of the base unit, and having a substrate mounted thereon; a fixi...
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| Hauptverfasser: | , |
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to a substrate processing device which comprises: a base unit having a ring shape to form a space for arranging a process module therein; a plurality of support units mounted along a circumferential length of the base unit, and having a substrate mounted thereon; a fixing unit disposed between the support units and fixing the substrate; and a driving unit rotated to operate the fixing unit. Therefore, a lower space of the substrate can be utilized and process efficiency can be improved.
본 발명은 기판처리장치에 관한 것으로, 링 형상을 하여 내부에 공정모듈 배치를 위한 공간이 형성되는 베이스부와, 베이스부의 원주길이를 따라 복수개가 장착되고 기판이 안착되는 지지부와, 지지부 사이에 배치되고 기판을 고정할 수 있는 고정부와, 고정부를 작동시키도록 회전되는 구동부를 포함하여, 기판의 하부 공간을 활용하고 공정 효율을 향상시킬 수 있다. |
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