RF CLOSED-LOOP MULTIPLE OUTPUT RADIO FREQUENCY RF MATCHING

Provided are an apparatus and a method for performing closed loop multiple output control of radio frequency (RF) matching for a semiconductor wafer manufacturing process. The apparatus for providing a signal comprises: a plurality of signal generators generating signals having a first frequency and...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	JUCO ELLER Y, LEESER KARL FREDERICK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BASIC ELECTRONIC CIRCUITRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS RESONATORS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Provided are an apparatus and a method for performing closed loop multiple output control of radio frequency (RF) matching for a semiconductor wafer manufacturing process. The apparatus for providing a signal comprises: a plurality of signal generators generating signals having a first frequency and a second frequency; a measurement circuit measuring a voltage standing wave ratio (VSWR); and a match reflection optimizer having a reactive component adjustable in response to an output signal from the measurement circuit. 반도체 웨이퍼 제조 프로세스를 위해 RF (radio frequency) 매칭의 폐루프 다중 출력 제어를 수행하기 위한 장치 및 방법이 제공된다.