Manufacture and equipment of microporous structure using anodaizing method of titanium implant

The present invention is devised to solve the problems of the prior art in which the existing osseointergration rate is poor as described above. The problem to be solved in the present invention is to provide a manufacturing method for increasing the osseointergration rate by generating a microporou...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIM KWUN MOOK, JEONG HYO BOK, JUNG HYUN WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE APPARATUS THEREFOR CHEMISTRY DENTISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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